Correlation Between Sputtering Conditions and Growth Properties of (TiAl)N/AlN Multilayer Coatings

Altuncu E., ÜSTEL F.

MATERIALS AND MANUFACTURING PROCESSES, cilt.24, ss.796-799, 2009 (SCI-Expanded) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 24
  • Basım Tarihi: 2009
  • Doi Numarası: 10.1080/10426910902840995
  • Dergi Adı: MATERIALS AND MANUFACTURING PROCESSES
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Sayfa Sayıları: ss.796-799
  • Kocaeli Üniversitesi Adresli: Evet

Özet

Multilayered coatings show better thermo/mechanical properties than monolayered coatings in cutting tool applications. In this study, TiAlN/AlN multilayer coatings were produced using diffirent magnetron sputtering physical vapor deposition (PVD) process parameters. Magnetron discharge power, bias voltages, and N2 flow rate will change growth morphology and surface quality of the coatings. The microstructure and growth morphologies correlated to sputtering conditions in a range of TiAlN/AlN multilayer coatings with nanoscale bilayer period thickness investigated carefully in order to identify the excellent properties of the coatings. Surface and fracture surfaces were characterized by scanning electron microscopy (SEM).